DocumentCode
54295
Title
High-Gain Millimeter-Wave AlGaN/GaN Transistors
Author
Schwantuschke, Dirk ; Bruckner, P. ; Quay, Ruediger ; Mikulla, Michael ; Ambacher, Oliver
Author_Institution
Fraunhofer Inst. for Appl. Solid State Phys. IAF, Freiburg, Germany
Volume
60
Issue
10
fYear
2013
fDate
Oct. 2013
Firstpage
3112
Lastpage
3118
Abstract
In this paper, the fabrication and performance of common-source (CS) and common-gate transistors for operation at millimeter-wave frequencies are presented. The AlGaN/GaN devices have a gate length of 100 nm and yield a high maximum transconductance of above 550 mS/mm with a very low contact resistance of less than 0.12 Ω·mm. The baseline technology with its optimized epitaxial structures and their transition frequency of more than 80 GHz allows reproducible designs for monolithic microwave integrated circuits up to the W-band frequency range (75-110 GHz). In addition, GaN dual-gate (DG) devices were developed for substantial improvement of the bandwidth of the devices and of the gain per stage on circuit level. This paper discusses the advantages of the DG devices in power gain over the CS high electron mobility transistors for millimeter-wave applications.
Keywords
III-V semiconductors; MMIC; aluminium compounds; contact resistance; gallium compounds; high electron mobility transistors; millimetre wave transistors; wide band gap semiconductors; AlGaN-GaN; CS high electron mobility transistors; DG devices; MMIC; baseline technology; circuit level; common-gate transistors; common-source transistors; contact resistance; dual-gate devices; frequency 75 GHz to 110 GHz; high-gain millimeter-wave transistors; monolithic microwave integrated circuits; optimized epitaxial structures; power gain; size 100 nm; transconductance; transition frequency; Current measurement; Gain; Gallium nitride; HEMTs; Logic gates; MMICs; Aluminum gallium nitride; Gallium nitride; millimeter wave devices; millimeter wave technology; transistors;
fLanguage
English
Journal_Title
Electron Devices, IEEE Transactions on
Publisher
ieee
ISSN
0018-9383
Type
jour
DOI
10.1109/TED.2013.2272180
Filename
6566037
Link To Document