DocumentCode :
54405
Title :
Full-Band 3-D Monte Carlo Simulation of InAs Nanowires and High Frequency Analysis
Author :
Popescu, Bogdan ; Popescu, Dan ; Saraniti, Marco ; Lugli, Paolo
Author_Institution :
Inst. for Nanoelectron., Tech. Univ. of Munich, Munich, Germany
Volume :
62
Issue :
6
fYear :
2015
fDate :
Jun-15
Firstpage :
1848
Lastpage :
1854
Abstract :
In this paper, we have investigated the electron transport and frequency response of the state-of-the-art single-InAs nanowire (NW) FETs using a full-band Monte Carlo simulator. InAs transistors using a single NW as the channel reveal excellent properties such as high current densities, high transconductance, and superior mobility when compared with silicon devices. One aspect that has been neglected until now is the high-frequency (HF) response of such devices. We perform a detailed HF analysis, calibrating our simulations with the experimental measurements that are successfully reproduced. We are able to make predictions about the electron distribution inside the NW transistor, and via a small signal analysis, we determine the intrinsic cutoff frequency and maximum frequency of oscillation. We compare these with the extrinsic measured figures of merit and observe a large discrepancy, which we are able to attribute to the parasitic elements. We finally perform a large signal analysis and investigate the nonlinearity of the device and the power transfer to the harmonics.
Keywords :
III-V semiconductors; Monte Carlo methods; current density; field effect transistors; frequency response; indium compounds; nanowires; semiconductor device models; InAs; InAs transistors; current density; electron distribution; electron transport; full-band 3D Monte Carlo simulation; high frequency analysis; high transconductance; high-frequency response; parasitic elements; power transfer; single-InAs nanowire FET; superior mobility; Analytical models; Capacitance; Doping; Gain; Logic gates; Scattering; Transistors; High frequency (HF); nanowire (NW) transistor; simulation; simulation.;
fLanguage :
English
Journal_Title :
Electron Devices, IEEE Transactions on
Publisher :
ieee
ISSN :
0018-9383
Type :
jour
DOI :
10.1109/TED.2015.2424403
Filename :
7102727
Link To Document :
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