DocumentCode :
548025
Title :
Investigation of double recessed gate SiC MESFETs with different recessed lengths
Author :
Razavi, Mohsen ; Orouji, Ali Asghar ; Hosseini, Seyed Ebrahim
Author_Institution :
Electr. Eng. Dept., Semnan Univ., Semnan, Iran
fYear :
2011
fDate :
17-19 May 2011
Firstpage :
1
Lastpage :
1
Abstract :
This paper compares the Double Recessed Gate (DRG) Silicon carbide (SiC) based metal semiconductor field effect transistors (MESFETs) with different double recessed gate lengths (Ldrg). We investigate the device performance focusing on breakdown voltage, DC trans-conductance, threshold voltage, short channel effect, drain current, DC output conductance, and gate capacitance with two-dimensional and two-carrier device simulations. Our simulation results demonstrate that with increasing the Ldrg in the DRG structure, the saturated drain current, short channel effects and the DC output conductance are reduced and the threshold voltage has positive shift. Increasing the Ldrg in the drain side reduces the gate capacitance and increases the breakdown voltage. Also, increasing the Ldrg in the source side increases the DC trans-conductance.
Keywords :
Schottky gate field effect transistors; semiconductor device breakdown; silicon compounds; wide band gap semiconductors; DC output conductance; DC transconductance; DRG MESFET; SiC; breakdown voltage; double recessed gate length; double recessed gate metal semiconductor field effect transistor; gate capacitance; saturated drain current; short channel effect; threshold voltage; two-carrier device simulation; two-dimensional device simulation; MESFET; SiC; double recessed gate; simulation;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Electrical Engineering (ICEE), 2011 19th Iranian Conference on
Conference_Location :
Tehran
Print_ISBN :
978-1-4577-0730-8
Type :
conf
Filename :
5955915
Link To Document :
بازگشت