DocumentCode
549287
Title
High performance submicron RTD design for mm-wave oscillator applications
Author
Kamgaing, A. Tchegho ; Muenstermann, B. ; Geitmann, R. ; Benner, O. ; Blekker, K. ; Prost, W. ; Tegude, F.J.
Author_Institution
Solid State Electron. Dept., Univ. Duisburg-Essen, Duisburg, Germany
fYear
2011
fDate
22-26 May 2011
Firstpage
1
Lastpage
4
Abstract
An optimization of the resonant tunnelling diode´s design was done in order to increase the high frequency performance by increasing the current density and minimizing the parasitic small signal parameters like series resistance and intrinsic parallel capacitance. The current density increased by thinning the lower doped contact layers (up to JP ≈ 495 kA/cm2). The modelling of the optimized devices was also successful. It is found that the advantage of higher current density and therefore higher available power density outweighs increased device capacitance due to the removal of the lower doped contact layer with respect to high frequency performance. The optimum RTD design has 50% lower capacitance at similar DC-operating point, 65% higher available RF-power and an increased cut off frequency up to 420 GHz.
Keywords
III-V semiconductors; current density; gallium arsenide; indium compounds; millimetre wave oscillators; resonant tunnelling diodes; semiconductor device models; InGaAs-InAs; current density; device capacitance; high-performance submicron RTD design; intrinsic parallel capacitance; lower doped contact layers; mm-wave oscillator applications; parasitic small signal parameters; resonant tunnelling diode; series resistance; Capacitance; Current density; Electrodes; Indium gallium arsenide; Oscillators; Resistance;
fLanguage
English
Publisher
ieee
Conference_Titel
Compound Semiconductor Week (CSW/IPRM), 2011 and 23rd International Conference on Indium Phosphide and Related Materials
Conference_Location
Berlin
Print_ISBN
978-1-4577-1753-6
Electronic_ISBN
978-3-8007-3356-9
Type
conf
Filename
5978282
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