DocumentCode :
549289
Title :
Influence of self-heating on the impact-ionization gate leakage in AlInAs/InGaAs/InP HEMTs
Author :
Scavennec, André ; Maher, Hassan ; Decobert, Jean
Author_Institution :
Apecofi, Paris, France
fYear :
2011
fDate :
22-26 May 2011
Firstpage :
1
Lastpage :
4
Abstract :
Excess gate leakage in AlInAs/InGaAs/InP HEMTs, resulting in a hump-shape superimposed to the conventional reverse current characteristics has been documented as originating from holes created by impact ionization in the channel. In some instances an anomalous behaviour has been reported with the appearance of double-hump Ig (Vgs) characteristics: while a first gate current hump appears close to pinch-off, a second hump shows up in open channel conditions, at higher drain voltages. In this paper, we show this feature of the gate leakage can be ascribed to the device self-heating, and the open-channel hump can be used to monitor the channel temperature.
Keywords :
III-V semiconductors; aluminium compounds; gallium arsenide; high electron mobility transistors; impact ionisation; indium compounds; AlInAs-InGaAs-InP; HEMT; double-hump characteristics; drain voltage; gate current; impact-ionization gate leakage; open channel conditions; reverse current characteristics; self-heating; HEMTs; Impact ionization; Indium gallium arsenide; Indium phosphide; Leakage current; Logic gates; MODFETs;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Compound Semiconductor Week (CSW/IPRM), 2011 and 23rd International Conference on Indium Phosphide and Related Materials
Conference_Location :
Berlin
Print_ISBN :
978-1-4577-1753-6
Electronic_ISBN :
978-3-8007-3356-9
Type :
conf
Filename :
5978284
Link To Document :
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