Title :
Nanoimprint lithography for photonic devices
Author_Institution :
Optoelectron. Res. Centre, Tampere Univ. of Technol., Tampere, Finland
Abstract :
Photonic devices, especially nanostructured components, play a key role in the integration of photonic devices and advanced applications. Cost and processing time are some of the bottlenecks of present nanolithography in the mass production of various structures and devices. Nanoimprint lithography is one of the candidates to reduce the cost and replication time. This presentation summarizes various devices we have realized by utilizing nanoimprint lithography for nanopatterning compound semiconductors and metals.
Keywords :
integrated optics; nanofabrication; nanolithography; nanopatterning; nanophotonics; optical fabrication; photolithography; soft lithography; compound semiconductors; metals; nanoimprint lithography; nanopatterning; photonic devices; Gratings; Nanolithography; Optical device fabrication; Optical waveguides; Photonics; Substrates; Waveguide lasers;
Conference_Titel :
Compound Semiconductor Week (CSW/IPRM), 2011 and 23rd International Conference on Indium Phosphide and Related Materials
Conference_Location :
Berlin
Print_ISBN :
978-1-4577-1753-6
Electronic_ISBN :
978-3-8007-3356-9
