DocumentCode
549389
Title
Injection velocity in thin-channel InAs HEMTs
Author
Kim, Tae-Woo ; del Alamo, Jesús A.
Author_Institution
Microsyst. Technol. Labs. (MTL), Massachusetts Inst. of Technol. (MIT), Cambridge, MA, USA
fYear
2011
fDate
22-26 May 2011
Firstpage
1
Lastpage
4
Abstract
We have experimentally extracted the virtual-source electron injection velocity in InAs HEMTs with a 5 nm thick channel. For long gate lengths, these devices exhibit noticeably worse injection velocity than thicker channel devices of a similar design. However, for very short gate lengths, as the devices approach the ballistic regime, the extracted injection velocity becomes rather independent of channel thickness. From these results, we can conclude that InAs-based QW-FETs with very thin channels have the potential of scaling to very short dimensions.
Keywords
III-V semiconductors; high electron mobility transistors; indium compounds; InAs; QW-FET; ballistic regime; channel thickness; long gate lengths; size 5 nm; thin-channel HEMT; virtual-source electron injection velocity; Capacitance; HEMTs; Logic gates; MODFETs; Materials; Scattering; Tin;
fLanguage
English
Publisher
ieee
Conference_Titel
Compound Semiconductor Week (CSW/IPRM), 2011 and 23rd International Conference on Indium Phosphide and Related Materials
Conference_Location
Berlin
Print_ISBN
978-1-4577-1753-6
Electronic_ISBN
978-3-8007-3356-9
Type
conf
Filename
5978395
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