• DocumentCode
    549389
  • Title

    Injection velocity in thin-channel InAs HEMTs

  • Author

    Kim, Tae-Woo ; del Alamo, Jesús A.

  • Author_Institution
    Microsyst. Technol. Labs. (MTL), Massachusetts Inst. of Technol. (MIT), Cambridge, MA, USA
  • fYear
    2011
  • fDate
    22-26 May 2011
  • Firstpage
    1
  • Lastpage
    4
  • Abstract
    We have experimentally extracted the virtual-source electron injection velocity in InAs HEMTs with a 5 nm thick channel. For long gate lengths, these devices exhibit noticeably worse injection velocity than thicker channel devices of a similar design. However, for very short gate lengths, as the devices approach the ballistic regime, the extracted injection velocity becomes rather independent of channel thickness. From these results, we can conclude that InAs-based QW-FETs with very thin channels have the potential of scaling to very short dimensions.
  • Keywords
    III-V semiconductors; high electron mobility transistors; indium compounds; InAs; QW-FET; ballistic regime; channel thickness; long gate lengths; size 5 nm; thin-channel HEMT; virtual-source electron injection velocity; Capacitance; HEMTs; Logic gates; MODFETs; Materials; Scattering; Tin;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Compound Semiconductor Week (CSW/IPRM), 2011 and 23rd International Conference on Indium Phosphide and Related Materials
  • Conference_Location
    Berlin
  • Print_ISBN
    978-1-4577-1753-6
  • Electronic_ISBN
    978-3-8007-3356-9
  • Type

    conf

  • Filename
    5978395