Title :
To DFM or not to DFM?
Author :
Tam, Wing Chiu ; Blanton, Shawn
Author_Institution :
Dept. of Electr. & Comput. Eng., Carnegie Mellon Univ., Pittsburgh, PA, USA
Abstract :
Design for manufacturability (DFM) is inevitable because of the formidable challenges encountered in nano-scale integrated circuit (IC) manufacturing. Unfortunately, it is difficult for designers to understand the cost-benefit tradeoff when tuning their design through DFM to achieve better manufacturability. This work attempts to assist the designer in this aspect by providing a methodology (called RADAR - Rule Assessment of Defect-Affected Regions) which uses failing-IC diagnosis results to systematically evaluate the effectiveness of DFM rules. RADAR is applied to the fail data from a 90nm Nvidia graphics processing unit (GPU) to demonstrate its viability. Specifically, evaluation of the via-enclosure rules revealed that they are much more needed in metal layers 3-6 than the remaining layers.
Keywords :
design for manufacture; integrated circuit design; DFM; GPU; IC manufacturing; Nvidia graphics processing unit; RADAR; design for manufacturability; failing-IC diagnosis; nanoscale integrated circuit manufacturing; rule assessment of defect-affected regions; size 90 nm; Databases; Integrated circuits; Layout; Metals; Radar; Statistical analysis; Testing; Design for Manufacturability; Diagnosis; Recommended Design Rules; Yield Modeling;
Conference_Titel :
Design Automation Conference (DAC), 2011 48th ACM/EDAC/IEEE
Conference_Location :
New York, NY
Print_ISBN :
978-1-4503-0636-2
