• DocumentCode
    549676
  • Title

    Phase transformation kinetics of HfO2 polymorphs in ultra-thin region

  • Author

    Nakajima, Y. ; Kita, K. ; Nishimura, T. ; Nagashio, K. ; Toriumi, A.

  • Author_Institution
    Dept. of Mater. Eng., Univ. of Tokyo, Tokyo, Japan
  • fYear
    2011
  • fDate
    14-16 June 2011
  • Firstpage
    84
  • Lastpage
    85
  • Abstract
    Thermodynamically non-equilibrium phase transformation in ultra thin HfO2 films was investigated. Amorphous HfO2 is crystallized into stable monoclinic phase via metastable cubic one. It was also demonstrated that the k-value of cubic-HfO2 was ~50. Kinetic analysis according to Mehl-Avrami-Johnson law pointed out the cubic-HfO2 is stable for practical use thanks to the suppression of monoclinic nucleus formation.
  • Keywords
    amorphous state; hafnium compounds; high-k dielectric thin films; nonequilibrium thermodynamics; polymorphic transformations; HfO2; Mehl-Avrami-Johnson law; amorphous ultrathin films; high-k dielectrics; polymorphs; stable monoclinic phase; thermodynamic nonequilibrium phase transformation kinetics; Annealing; Films; Hafnium compounds; Kinetic theory; Silicon; Very large scale integration; X-ray scattering; Cubic; HfO2; Higher-k; Kinetics and Mehl-Avrami-Johnson law; Martensite; Phase transformation;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    VLSI Technology (VLSIT), 2011 Symposium on
  • Conference_Location
    Honolulu, HI
  • ISSN
    0743-1562
  • Print_ISBN
    978-1-4244-9949-6
  • Type

    conf

  • Filename
    5984520
    • Link To Document
    https://search.isc.ac/dl/search/defaultta.aspx?DTC=49&DC=549676