Title :
Design of embedded memory and logic based on pattern constructs
Author :
Morris, Daniel ; Vaidyanathan, Kaushik ; Lafferty, Neal ; Lai, Kafai ; Liebmann, Lars ; Pileggi, Larry
Author_Institution :
Carnegie Mellon Univ., Pittsburgh, PA, USA
Abstract :
Design rules become ineffective for interfacing layout design and manufacturing when complex lithography sources are used for sub-20 nm patterning. Experiments demonstrate feasibility of a construct-based design that facilitates control of process capabilities and captures layout dependent variations. Results for early 14 nm patterning experiments are shown for logic and memory circuits.
Keywords :
integrated circuit layout; integrated memory circuits; lithography; logic circuits; logic design; construct-based design; embedded logic circuits; embedded memory circuits; layout design; lithography sources; pattern constructs; patterning experiments; size 14 nm; size 20 nm; Fabrics; Gratings; Layout; Lithography; Optimization; Shape;
Conference_Titel :
VLSI Technology (VLSIT), 2011 Symposium on
Conference_Location :
Honolulu, HI
Print_ISBN :
978-1-4244-9949-6
