DocumentCode
551364
Title
An integrated MEMS vacuum diode
Author
Resnick, P.J. ; Langlois, E.
Author_Institution
Sandia Nat. Labs., Albuquerque, NM, USA
fYear
2011
fDate
18-22 July 2011
Firstpage
161
Lastpage
162
Abstract
MEMS processing technologies have been used to create a wide variety of devices, including photonic crystals and microfluidic structures. These methodologies were adapted to fabricate an in situ vacuum sealed cold-cathode diode. Cathodes were formed from arrays of tungsten-clad silicon tips. Tungsten anodes, separated by a sacrificial film, were fabricated above each tip, within a vacuum microcavity. Initial test data are consistent with Fowler-Nordheim behavior, with an on/off current ratio of nearly 7 decades in forward bias.
Keywords
cathodes; diodes; microfluidics; photonic crystals; silicon; tungsten; Fowler-Nordheim behavior; forward bias; in situ vacuum sealed cold-cathode diode; integrated MEMS vacuum diode; microfluidic structures; photonic crystals; sacrificial film; tungsten anodes; tungsten-clad silicon tips; vacuum microcavity; Anodes; Cathodes; Films; Microcavities; Silicon; Tungsten; MEMS; cold cathode; vacuum diode;
fLanguage
English
Publisher
ieee
Conference_Titel
Vacuum Nanoelectronics Conference (IVNC), 2011 24th International
Conference_Location
Wuppertal
ISSN
pending
Print_ISBN
978-1-4577-1243-2
Electronic_ISBN
pending
Type
conf
Filename
6004612
Link To Document