DocumentCode
551809
Title
Growth of Co thin films by magnetron sputtering method and its performance analysis
Author
Yuan, Min ; Pu, Li-Chun ; Feng, Wen-Lin ; Chen, Peng
Author_Institution
Sch. of Photoelectric Inf., Chongqing Univ. of Technol., Chongqing, China
Volume
2
fYear
2011
fDate
29-31 July 2011
Abstract
In the present paper, the Co film has been prepared successfully by magnetron sputtering method. The thin film character of surface, the structure characteristic and magnetism characteristic have been analyzed. The results have been analyzed and discussed.
Keywords
cobalt; ferromagnetic materials; magnetic hysteresis; magnetic thin films; metallic thin films; sputter deposition; surface structure; Co; cobalt thin films; ferromagnetic materials; magnetic hysteresis loops; magnetism; magnetron sputtering; surface structure; Magnetic films; Magnetic properties; Magnetization; Presses; Saturation magnetization; Sputtering; Co thin films; Magnetron sputtering method; performance analysis;
fLanguage
English
Publisher
ieee
Conference_Titel
Electronics and Optoelectronics (ICEOE), 2011 International Conference on
Conference_Location
Dalian
Print_ISBN
978-1-61284-275-2
Type
conf
DOI
10.1109/ICEOE.2011.6013252
Filename
6013252
Link To Document