Title :
Stress-induced modal dispersion on SOI waveguide
Author :
Lu, Tse-Jen ; Tseng, Sheng-Chieh ; Hsu, Shih-Hsiang
Author_Institution :
Dept. of Electron. Eng., Nat. Taiwan Univ. of Sci. & Technol., Taipei, Taiwan
Abstract :
We utilized a phase-sensitive low-coherence interferometry to characterize the stress-induced intermodal group delay and intramodal dispersion in a 5-μm thick silicon-on-insulator waveguide, which were demonstrated as 0.43 ps and -16 ps/(nm.km), respectively.
Keywords :
integrated optics; optical communication equipment; optical dispersion; optical testing; optical waveguides; phase shifting interferometry; piezo-optical effects; silicon-on-insulator; SOI waveguide; Si-SiO2; optical telecommunications; phase-sensitive low-coherence interferometry; silicon-on-insulator waveguide; size 5 mum; stress-induced intermodal group delay; stress-induced modal dispersion; Chromatic dispersion; Optical interferometry;
Conference_Titel :
Opto-Electronics and Communications Conference (OECC), 2011 16th
Conference_Location :
Kaohsiung
Print_ISBN :
978-1-61284-288-2
Electronic_ISBN :
978-986-02-8974-9
