• DocumentCode
    553393
  • Title

    A robust top structure design in a field-stop emitter-implant trench-gate IGBT for improved short circuit ruggedness

  • Author

    Alessandria, A. ; Fragapane, Leonardo

  • Author_Institution
    STMicroelectron. s.r.l., Catania, Italy
  • fYear
    2011
  • fDate
    Aug. 30 2011-Sept. 1 2011
  • Firstpage
    1
  • Lastpage
    8
  • Abstract
    This paper is related to the top structure design optimization in the case of a 1.2KV Field-Stop (FS) Emitter-implant (EI) Trench-gate IGBT. In particular we focused our attention on the electrical behavior of the device and, above all, on some specific electrical characteristics in order to address all the applications where the short-circuit withstanding time is a key parameter. The results of the optimization are shown in this paper through a simulation study.
  • Keywords
    insulated gate bipolar transistors; optimisation; short-circuit currents; electrical characteristics; emitter-implant IGBT; field-stop IGBT; optimization; robust top structure; short circuit ruggedness; trench-gate IGBT; voltage 1.2 kV; Electric variables; Insulated gate bipolar transistors; Logic gates; Numerical simulation; Performance evaluation; Strips; Transistors; Design; IGBT; Power semiconductor device; Simulation;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Power Electronics and Applications (EPE 2011), Proceedings of the 2011-14th European Conference on
  • Conference_Location
    Birmingham
  • Print_ISBN
    978-1-61284-167-0
  • Electronic_ISBN
    978-90-75815-15-3
  • Type

    conf

  • Filename
    6020250