DocumentCode :
554261
Title :
Studies on the influence of sputtering parameters on magneto-optical properties of GdTbFeCo thin films
Author :
Zhixin Huang ; Ji-hua Guo ; Lei Yang ; Jian-bo Shao
Author_Institution :
Coll. of Phys. Sci. & Technol., China Normal Univ., Wuhan, China
Volume :
1
fYear :
2011
fDate :
12-14 Aug. 2011
Firstpage :
506
Lastpage :
508
Abstract :
Amorphous GdTbFeCo magnetic thin films are prepared onto glass substrates by RF magnetron sputtering system from a mosaic target. The effect of sputtering power, sputtering time and sputtering pressure on the magnetic properties of the thin films are investigated by the parameter control method. It is found that when the sputtering power, sputtering pressure and sputtering time of the GdTbFeCo thin Films are 75W, 0.5Pa and 613 second, respectively, the coercivity with perpendicular anisotropy is as high as 6735 Oe.
Keywords :
amorphous magnetic materials; cobalt alloys; coercive force; ferromagnetic materials; gadolinium alloys; iron alloys; magnetic thin films; magneto-optical effects; perpendicular magnetic anisotropy; sputter deposition; terbium alloys; GdTbFeCo; RF magnetron sputtering; SiO2; amorphous magnetic thin films; coercivity; glass substrates; magnetic properties; magnetooptical properties; mosaic target; perpendicular anisotropy; power 75 W; pressure 0.5 Pa; sputtering power; sputtering pressure; sputtering time; thin films; time 613 s; Coercive force; Magnetic films; Magnetic properties; Perpendicular magnetic recording; Sputtering; GdTbFeCo thin film; magneto-optical property; magnetron sputtering; parameter control method;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Electronic and Mechanical Engineering and Information Technology (EMEIT), 2011 International Conference on
Conference_Location :
Harbin, Heilongjiang, China
Print_ISBN :
978-1-61284-087-1
Type :
conf
DOI :
10.1109/EMEIT.2011.6022966
Filename :
6022966
Link To Document :
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