Title :
Preparation of titanium oxides films by CVD in O2-N2 atmosphere
Author :
Liping Sun ; Rong Deng ; Yuan Yuan ; Huiqiu Deng
Author_Institution :
Dept. of Electron. & Commun. Eng., Univ. of Changsha, Changsha, China
Abstract :
The effect of O2 fraction of N2 and O2 on crystalline phases, deposition rates and microstructures of titanium oxides films deposited by laser CVD was studied. With decreasing O2 fraction and increasing laser power, rutile TiO2, anatase TiO2, Ti9O17 and Ti6O11 films were obtained in turn, implying the magneli phase formed easily at high temperature and low O2 fraction. The deposition rates increased with increasing O2 fraction. The films cross-sectional structures became denser with increasing O2 fraction.
Keywords :
chemical vapour deposition; laser materials processing; semiconductor thin films; titanium compounds; Ti6O11; Ti9O17; TiO2; cross-sectional structure; crystalline phases; laser CVD; magneli phase; microstructural property; titanium oxides films; Atmosphere; Films; Power lasers; Substrates; Surface morphology; Surface treatment; Titanium; Deposited titanium oxides films; Laser CVD in O2-N2; TiO2 film;
Conference_Titel :
Electronic and Mechanical Engineering and Information Technology (EMEIT), 2011 International Conference on
Conference_Location :
Harbin, Heilongjiang, China
Print_ISBN :
978-1-61284-087-1
DOI :
10.1109/EMEIT.2011.6023460
