• DocumentCode
    554543
  • Title

    Preparation of titanium oxides films by CVD in O2-N2 atmosphere

  • Author

    Liping Sun ; Rong Deng ; Yuan Yuan ; Huiqiu Deng

  • Author_Institution
    Dept. of Electron. & Commun. Eng., Univ. of Changsha, Changsha, China
  • Volume
    4
  • fYear
    2011
  • fDate
    12-14 Aug. 2011
  • Firstpage
    1829
  • Lastpage
    1831
  • Abstract
    The effect of O2 fraction of N2 and O2 on crystalline phases, deposition rates and microstructures of titanium oxides films deposited by laser CVD was studied. With decreasing O2 fraction and increasing laser power, rutile TiO2, anatase TiO2, Ti9O17 and Ti6O11 films were obtained in turn, implying the magneli phase formed easily at high temperature and low O2 fraction. The deposition rates increased with increasing O2 fraction. The films cross-sectional structures became denser with increasing O2 fraction.
  • Keywords
    chemical vapour deposition; laser materials processing; semiconductor thin films; titanium compounds; Ti6O11; Ti9O17; TiO2; cross-sectional structure; crystalline phases; laser CVD; magneli phase; microstructural property; titanium oxides films; Atmosphere; Films; Power lasers; Substrates; Surface morphology; Surface treatment; Titanium; Deposited titanium oxides films; Laser CVD in O2-N2; TiO2 film;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Electronic and Mechanical Engineering and Information Technology (EMEIT), 2011 International Conference on
  • Conference_Location
    Harbin, Heilongjiang, China
  • Print_ISBN
    978-1-61284-087-1
  • Type

    conf

  • DOI
    10.1109/EMEIT.2011.6023460
  • Filename
    6023460
    • Link To Document
    https://search.isc.ac/dl/search/defaultta.aspx?DTC=49&DC=554543