• DocumentCode
    556066
  • Title

    Development of an optical near-field test bench for EMC application

  • Author

    David, Chevallier ; David, Baudry ; Anne, Louis

  • Author_Institution
    ESIGELEC, IRSEEM, St. Etienne du Rouvray, France
  • fYear
    2011
  • fDate
    26-30 Sept. 2011
  • Firstpage
    531
  • Lastpage
    536
  • Abstract
    In this paper, the two different kinds of near-field measuring techniques are presented. The first one uses coaxial probes that does not give precise measurements on microelectronic devices. The second one is based on the Pockels effect that converts an electromagnetic (EM) field into optical modulation. The performance of the EO probe is compared with dipole probes of 2.5 and 5 mm with the use of simulations and measurements on a wire above a plane and coupled micro strip lines. At the end, a discussion about the technical limitations of the EO probe is made.
  • Keywords
    Pockels effect; electromagnetic compatibility; EMC application; EO probe; Pockels effect; coaxial probes; coupled microstrip lines; dipole probes; electromagnetic field; microelectronic devices; near-field measuring techniques; optical modulation; optical near-field test bench; Crystals; Electromagnetic compatibility; Optical fibers; Optical sensors; Optical variables measurement; Probes; EMC; Electrooptic; Near-field; Pockels effect; Probes; Spatial resolution;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    EMC Europe 2011 York
  • Conference_Location
    York
  • Print_ISBN
    978-1-4577-1709-3
  • Type

    conf

  • Filename
    6078582