DocumentCode
556066
Title
Development of an optical near-field test bench for EMC application
Author
David, Chevallier ; David, Baudry ; Anne, Louis
Author_Institution
ESIGELEC, IRSEEM, St. Etienne du Rouvray, France
fYear
2011
fDate
26-30 Sept. 2011
Firstpage
531
Lastpage
536
Abstract
In this paper, the two different kinds of near-field measuring techniques are presented. The first one uses coaxial probes that does not give precise measurements on microelectronic devices. The second one is based on the Pockels effect that converts an electromagnetic (EM) field into optical modulation. The performance of the EO probe is compared with dipole probes of 2.5 and 5 mm with the use of simulations and measurements on a wire above a plane and coupled micro strip lines. At the end, a discussion about the technical limitations of the EO probe is made.
Keywords
Pockels effect; electromagnetic compatibility; EMC application; EO probe; Pockels effect; coaxial probes; coupled microstrip lines; dipole probes; electromagnetic field; microelectronic devices; near-field measuring techniques; optical modulation; optical near-field test bench; Crystals; Electromagnetic compatibility; Optical fibers; Optical sensors; Optical variables measurement; Probes; EMC; Electrooptic; Near-field; Pockels effect; Probes; Spatial resolution;
fLanguage
English
Publisher
ieee
Conference_Titel
EMC Europe 2011 York
Conference_Location
York
Print_ISBN
978-1-4577-1709-3
Type
conf
Filename
6078582
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