Title :
Photoresist strip effects on dopant distribution, activation and junction recess
Author :
Berry, Ivan L., III
Author_Institution :
Strategic Technology, Axcelis Technologies
Abstract :
A collection of slides about photoresist strip effects on dopant distribution, activation and junction recess is presented.
Keywords :
photoresists; dopant activation; dopant distribution; dopant junction recess; photoresist strip effects; Hydrogen; Implants; Logic gates; Oxygen; Silicon; Silicon germanium; Strips;
Conference_Titel :
Semiconductor Manufacturing (ISSM) and e-Manufacturing and Design Collaboration Symposium (eMDC), 2011 International Symposium on
Conference_Location :
Hsinchu
Print_ISBN :
978-1-4577-1647-8
