DocumentCode :
556811
Title :
Study on lamp heating system for SiGe selective epitaxial growth fabrication process
Author :
Chang, Chih-Tien
Author_Institution :
Manuf. Technol. Center, Taiwan Semicond. Manuf. Co., Ltd., Hsinchu, Taiwan
fYear :
2011
fDate :
5-6 Sept. 2011
Firstpage :
1
Lastpage :
10
Abstract :
A collection of slides about lamp heating system for SiGe selective epitaxial growth fabrication process is presented.
Keywords :
Ge-Si alloys; epitaxial growth; heating; lamps; SiGe; fabrication process; lamp heating system; selective epitaxial growth; Collaboration; Epitaxial growth; Heating; Joints; Manufacturing; Silicon germanium;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Semiconductor Manufacturing (ISSM) and e-Manufacturing and Design Collaboration Symposium (eMDC), 2011 International Symposium on
Conference_Location :
Hsinchu
ISSN :
1523-553X
Print_ISBN :
978-1-4577-1647-8
Type :
conf
Filename :
6086038
Link To Document :
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