DocumentCode
556815
Title
Optimization and monitoring of bevel removal process
Author
Chen, Yi-Chin ; Hsu, Hui-Ying ; Hung, Che-Lun ; Luoh, Tuung ; Yang, Ling-Wu ; Yang, Tahone ; Chen, Kuang-Chao ; Lu, Chih-Yuan
fYear
2011
fDate
5-6 Sept. 2011
Firstpage
1
Lastpage
15
Abstract
A collection of slides about wafer edge inspection, tri-layer coating monitoring inspection, photoresist coating with different wafer suppliers and bevel etching removal process inspection is presented.
Keywords
coatings; etching; inspection; photoresists; bevel etching removal process inspection; bevel removal process; photoresist coating; tri-layer coating monitoring inspection; wafer edge inspection; wafer suppliers; Coatings; Facsimile; Inspection; Lithography; Monitoring; Optimization; Resists;
fLanguage
English
Publisher
ieee
Conference_Titel
Semiconductor Manufacturing (ISSM) and e-Manufacturing and Design Collaboration Symposium (eMDC), 2011 International Symposium on
Conference_Location
Hsinchu
ISSN
1523-553X
Print_ISBN
978-1-4577-1647-8
Type
conf
Filename
6086042
Link To Document