Title :
Blind contact detection in the irregularly periphery area using leap & scan e-beam inspection
Author :
Liao, Hsiang-Chou ; Hung, Che-Lun ; Luoh, Tuung ; Yang, Ling-Wu ; Yang, Tahone ; Chen, Kuang-Chao ; Lu, Chih-Yuan
Abstract :
A collection of slides from the authors´ conference presentation about the blind contact detection in the irregularly periphery area using leap and scan e-beam inspection is presented.
Keywords :
electron beam applications; semiconductor device manufacture; blind contact detection; e beam inspection; irregularly periphery area; Electric fields; Facsimile; Gate leakage; Inspection; Joints; Optimization;
Conference_Titel :
Semiconductor Manufacturing (ISSM) and e-Manufacturing and Design Collaboration Symposium (eMDC), 2011 International Symposium on
Conference_Location :
Hsinchu
Print_ISBN :
978-1-4577-1647-8
