Title :
Defect management with reticle-to-wafer correlations
Author :
Hsu, Wen-Hao ; Gau, Yeu-Dong ; Tseng, David ; Yong, Poh-Boon
Abstract :
A collection of slides from the Andy Tsen´s conference presentation about a Rosebrock´s diagonal dominance study on multiple resolution APC is presented.
Keywords :
crystal defects; reticles; semiconductor device manufacture; semiconductor industry; defect management; reticle to wafer correlations; Collaboration; Complexity theory; Inspection; Joints; Manufacturing; Monitoring; Repeaters;
Conference_Titel :
Semiconductor Manufacturing (ISSM) and e-Manufacturing and Design Collaboration Symposium (eMDC), 2011 International Symposium on
Conference_Location :
Hsinchu
Print_ISBN :
978-1-4577-1647-8
