Title :
Lithium Electrochemical and Electrochromic Properties of Atmospheric Pressure Plasma Jet-Synthesized Tungsten/Molybdenum Mixed Oxide Films for Flexible Electrochromic Devices
Author :
Yung-Sen Lin ; Tsung-Hsien Tsai ; Wei-Hau Lu
Author_Institution :
Dept. of Chem. Eng., Feng Chia Univ., Taichung, Taiwan
Abstract :
Lithium electrochemical and electrochromic (EC) performances of flexible tungsten/molybdenum mixed oxide (WMoxOyCz) films, deposited onto 40-Ω/square flexible polyethylene terephthalate/indium tin oxide substrates at room temperature (~23°C) and at the short exposed durations of 19-26 s using an atmospheric-pressure plasma-enhanced chemical vapor deposition with an atmospheric pressure plasma jet (APPJ) at various precursor injection angles, are investigated. The flexible organo-tungsten-molybdenum oxide (WMoxOyCz) films have been identified for the remarkable EC performance for 200 cycles of reversible Li+ ion intercalation and deintercalation in a 1-M LiClO4-propylene carbonate electrolyte by a potential sweep switching measurement between -1 and 1 V at a scan rate of 50 mV/s, even after being bent 360° around a 2.5-cm diameter rod for 1000 cycles. The optical modulation (AT) is up to of 75.6% at a wavelength of 691.9 nm for WMoxOyCz films cosynthesized with an APPJ.
Keywords :
electrochemistry; electrochromism; electrolytes; lithium; molybdenum compounds; optical modulation; plasma CVD; plasma jets; thin films; tungsten compounds; Li; WMoxOyCz; atmospheric pressure plasma jet; atmospheric-pressure plasma-enhanced chemical vapor deposition; electrochemical properties; electrochromic properties; electrolyte; flexible electrochromic devices; flexible organo-tungsten-molybdenum oxide films; flexible polyethylene terephthalate-indium tin oxide substrates; injection angles; lithium ion deintercalation; lithium ion intercalation; optical modulation; potential sweep switching measurement; pressure 1 atm; scan rate; temperature 293 K to 298 K; time 19 s to 26 s; Indium tin oxide; Plasmas; Positron emission tomography; Substrates; Surface morphology; Surface treatment; Tungsten; Atmospheric pressure plasma; electrochromic (EC) films; molybdenum oxide; plasma-enhanced chemical vapor deposition (PECVD); tungsten oxide;
Journal_Title :
Plasma Science, IEEE Transactions on
DOI :
10.1109/TPS.2014.2348016