DocumentCode :
558530
Title :
Bias point optimization for low power / low noise applications of advanced SiGe HBT
Author :
Waldhoff, Nicolas ; Danneville, François ; Rolland, Nathalie ; Rolland, Paul-Alain ; Aufinger, Klaus
Author_Institution :
Cite Sci., IEMN-IRCICA, Villeneuve-d´´Ascq, France
fYear :
2011
fDate :
10-11 Oct. 2011
Firstpage :
386
Lastpage :
389
Abstract :
In this paper, the best trade-off between low power consumption and low noise performance of a commercial bipolar transistor is investigated. In a first step, SiGe HBTs featuring various geometries are benchmarked, focusing on DC characteristics (Gummel plot); this allows the selection of the best device to be measured in microwave range. On this transistor, several figure-of-merits (FoMs) such as cut-off frequencies, minimum noise figure, and available gain, are extracted for the entire DC I(V) characteristic. With the help of iso-curves, our study allows to select optimized biasing range, useful for designers to design Low Noise Amplifiers (LNAs) featuring both low power and low noise performance.
Keywords :
Ge-Si alloys; circuit optimisation; heterojunction bipolar transistors; low noise amplifiers; low-power electronics; microwave amplifiers; semiconductor device noise; DC I(V) characteristic; DC characteristics; SiGe; advanced SiGe HBT; bias point optimization; commercial bipolar transistor; figure-of-merits; low noise amplifier; low noise application; low power application; low power consumption; microwave range; minimum noise figure; Gain; Integrated circuits; Noise; Power demand; Probes; Silicon germanium; Transistors; Bias conditions; Low noise; Low power; SiGe HBT technology; iso-curves;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Microwave Integrated Circuits Conference (EuMIC), 2011 European
Conference_Location :
Manchester
Print_ISBN :
978-1-61284-236-3
Type :
conf
Filename :
6102851
Link To Document :
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