DocumentCode :
559801
Title :
A study on the improvement of mold life-time in UV nanoimprint
Author :
Ozawa, Satoru ; Nakai, Yuusuke ; Jigami, Tetsuya ; Wakabayashi, Shigeo ; Fujiwara, Tadayuki
Author_Institution :
Mitsubishi Rayon Co., Ltd., Hiroshima, Japan
fYear :
2011
fDate :
Oct. 30 2011-Nov. 2 2011
Firstpage :
1
Lastpage :
2
Abstract :
Long mold-life time is great important for roll-to-roll process in UV nanoimprint. We investigated the cause of the decay of the releasing performance by various surface characterization methods. We optimized the coating condition of the releasing agent, and we have achieved the elongation of the mold life-time.
Keywords :
X-ray photoelectron spectra; aluminium; metallic thin films; moulding; nanolithography; polymer films; rolling; secondary ion mass spectra; ultraviolet lithography; Al; UV nanoimprint; coating condition; decay; mold lifetime elongation; releasing agent; roll-to-roll process; surface characterization methods; X-ray imaging;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Microopics Conference (MOC), 2011 17th
Conference_Location :
Sendai
Print_ISBN :
978-1-4577-1344-6
Type :
conf
Filename :
6110357
Link To Document :
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