Title :
Fabrication of Si wire waveguides composed of amorphous Si
Author :
Kitamura, Y. ; Yamaguchi, T. ; Saiki, K. ; Hiidome, K. ; Kirimura, K. ; Katsuyama, T. ; Tokuda, M. ; Takagi, H. ; Morita, M. ; Ito, Y. ; Tsutsui, K. ; Wada, Y.
Author_Institution :
Grad. Sch. of Eng., Univ. of Fukui, Fukui, Japan
fDate :
Oct. 30 2011-Nov. 2 2011
Abstract :
We have successfully fabricated high-quality Si wire waveguides composed of amorphous Si. The surface bend of the waveguide was fairly reduced by annealing. The loss is 11.7 dB/mm before annealing and the loss is changed to 6.4 dB/mm after annealing, which indicates the importance of the waveguide-surface-imperfection loss.
Keywords :
amorphous semiconductors; annealing; elemental semiconductors; optical fabrication; optical losses; optical waveguides; silicon; Si-SiO2; amorphous silicon; annealing; surface bend; waveguide fabrication; waveguide surface imperfection loss; Atom optics; Integrated optics; Optical device fabrication; Optical fibers; Optical imaging;
Conference_Titel :
Microopics Conference (MOC), 2011 17th
Conference_Location :
Sendai
Print_ISBN :
978-1-4577-1344-6
