• DocumentCode
    559807
  • Title

    Fabrication of Si wire waveguides composed of amorphous Si

  • Author

    Kitamura, Y. ; Yamaguchi, T. ; Saiki, K. ; Hiidome, K. ; Kirimura, K. ; Katsuyama, T. ; Tokuda, M. ; Takagi, H. ; Morita, M. ; Ito, Y. ; Tsutsui, K. ; Wada, Y.

  • Author_Institution
    Grad. Sch. of Eng., Univ. of Fukui, Fukui, Japan
  • fYear
    2011
  • fDate
    Oct. 30 2011-Nov. 2 2011
  • Firstpage
    1
  • Lastpage
    2
  • Abstract
    We have successfully fabricated high-quality Si wire waveguides composed of amorphous Si. The surface bend of the waveguide was fairly reduced by annealing. The loss is 11.7 dB/mm before annealing and the loss is changed to 6.4 dB/mm after annealing, which indicates the importance of the waveguide-surface-imperfection loss.
  • Keywords
    amorphous semiconductors; annealing; elemental semiconductors; optical fabrication; optical losses; optical waveguides; silicon; Si-SiO2; amorphous silicon; annealing; surface bend; waveguide fabrication; waveguide surface imperfection loss; Atom optics; Integrated optics; Optical device fabrication; Optical fibers; Optical imaging;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Microopics Conference (MOC), 2011 17th
  • Conference_Location
    Sendai
  • Print_ISBN
    978-1-4577-1344-6
  • Type

    conf

  • Filename
    6110363
    • Link To Document
    https://search.isc.ac/dl/search/defaultta.aspx?DTC=49&DC=559807