• DocumentCode
    563465
  • Title

    Substrate fed logic - An improved form of injection logic

  • Author

    Blatt, V. ; Kennedy, L W ; Walsh, P.S. ; Ashford, R.C.A.

  • Author_Institution
    Allen Clark Res. Centre, Plessey Co. Ltd., Towcester, UK
  • fYear
    1974
  • fDate
    9-11 Dec. 1974
  • Firstpage
    511
  • Lastpage
    514
  • Abstract
    A novel form of integrated injection logic is described which has significant advantages over its conventional counterpart in packing density and power-delay product. The structure is formed from two epitaxial layers on a heavily doped p type substrate. The p type epitaxial layer, which forms the base of the npn transistor, is lightly doped, allowing the fabrication of Schottky contacts. This gives rise to an extremely powerful multi-input, multi-output logic element on a single base land. The fundamental SFL structure has been successfully demonstrated. Gates and a ring oscillator have been operated and a reduction in power-delay product has been shown. A viable technology for Schottky Barrier Diodes has been demonstrated and an optimised structure has been designed.
  • Keywords
    MOSFET; Schottky barriers; Schottky diodes; heavily doped semiconductors; integrated injection logic; oscillators; semiconductor epitaxial layers; SFL structure; Schottky barrier diodes; Schottky contacts fabrication; heavily doped p-type substrate; integrated injection logic; multiinput multioutput logic element; n-p-n transistor; p-type epitaxial layer; packing density; power-delay product; ring oscillator; single base land; Abstracts; Epitaxial growth; Implants; Logic gates; Schottky diodes; Silicon; Substrates;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Electron Devices Meeting (IEDM), 1974 International
  • Conference_Location
    Washington, DC
  • ISSN
    0163-1918
  • Type

    conf

  • DOI
    10.1109/IEDM.1974.6219673
  • Filename
    6219673