Title :
Sleep and aes applied to solid state devices and materials
Author :
Gray, Henry F. ; Haas, George A.
Author_Institution :
Naval Res. Lab., Washington, DC, USA
Abstract :
A Scanning Low Energy Electron Probe (SLEEP), which has a spatial resolution of 3ε and an energy resolution of 50 mV near zero energy has been used in conjuntion with a cylindrical Auger Electron Spectrometer (AES) to study several surface properties of solid state devices and materials. The resistivity (ρ), dielectric constant (K), and dielectric strength of thin insulating layers (e.g., Al2O3) have been measured with SLEEP. AES has been used with inert gas sputtering to study the depth profile of ion implanted Aland Na in Si and SiO2 and have been compared with other profiling techniques using identical samples. Surface potential variations of vacuum deposited metallic coatings on an integrated circuit using SLEEP has been correlated with surface impurities measured in situ with AES. In addition, examples will be given illustrating how the SLEEP technique can be used in an SEM mode for measuring secondary electron emission properties as well as for observing the location of defects in integrated circuits.
Keywords :
Auger electron spectra; electric strength; inert gases; integrated circuits; permittivity; scanning electron microscopy; sputtering; vacuum deposited coatings; AES; SEM mode; cylindrical Auger electron spectrometer; defect location; dielectric constant; dielectric strength; energy resolution; inert gas sputtering; integrated circuit; resistivity; scanning low energy electron probe; secondary electron emission property measurement; solid state device; solid state material; spatial resolution; surface impurity measurement; surface potential variation; surface property; thin insulating layer; vacuum deposited metallic coating; Abstracts; Barium; Dielectric measurements; Materials; Surface cleaning; Surface topography;
Conference_Titel :
Electron Devices Meeting (IEDM), 1974 International
Conference_Location :
Washington, DC
DOI :
10.1109/IEDM.1974.6219810