DocumentCode :
563583
Title :
Synthesis of Ti-Al intermetallic compounds films by intense pulsed ion-beam evaporation
Author :
Suzuki, T. ; Kishima, M. ; Jiang, W. ; Yatsui, K.
Author_Institution :
Extreme Energy-Density Research Institute, Nagaoka University of Technology, 1603-1 Kamitomioka, Niigata 940-2188, Japan
fYear :
2000
fDate :
20-25 June 2000
Firstpage :
621
Lastpage :
624
Abstract :
In order to examine the possibility of the synthesis of an intermetallic compound thin film by ion beam evaporation (IBE), the synthesis of a Ti-Al system intermetallic compound thin film was tried. The crystal structure and composition of the film were evaluated. By using combined target of Ti and Al, thin film of single phase was not observed. By using alloy target, the Ti3Al film was formed successfully. The Ti3Al film has been orientated in the (002) plane. The orientation to the (002) plane was strengthened by heating the substrate.
Keywords :
Artificial intelligence; Crystals; Films; Heating; Silicon; Ti3Al; intermetallic compound; ion beam evaporation; orientation;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
High-Power Particle Beams, 2000 13th International Conference on
Conference_Location :
Nagaoka, Japan
Type :
conf
Filename :
6219947
Link To Document :
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