• DocumentCode
    563583
  • Title

    Synthesis of Ti-Al intermetallic compounds films by intense pulsed ion-beam evaporation

  • Author

    Suzuki, T. ; Kishima, M. ; Jiang, W. ; Yatsui, K.

  • Author_Institution
    Extreme Energy-Density Research Institute, Nagaoka University of Technology, 1603-1 Kamitomioka, Niigata 940-2188, Japan
  • fYear
    2000
  • fDate
    20-25 June 2000
  • Firstpage
    621
  • Lastpage
    624
  • Abstract
    In order to examine the possibility of the synthesis of an intermetallic compound thin film by ion beam evaporation (IBE), the synthesis of a Ti-Al system intermetallic compound thin film was tried. The crystal structure and composition of the film were evaluated. By using combined target of Ti and Al, thin film of single phase was not observed. By using alloy target, the Ti3Al film was formed successfully. The Ti3Al film has been orientated in the (002) plane. The orientation to the (002) plane was strengthened by heating the substrate.
  • Keywords
    Artificial intelligence; Crystals; Films; Heating; Silicon; Ti3Al; intermetallic compound; ion beam evaporation; orientation;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    High-Power Particle Beams, 2000 13th International Conference on
  • Conference_Location
    Nagaoka, Japan
  • Type

    conf

  • Filename
    6219947
    • Link To Document
    https://search.isc.ac/dl/search/defaultta.aspx?DTC=49&DC=563583