DocumentCode :
563699
Title :
Pulsed power technology and its applications at EDI, Nagaoka
Author :
Yatsui, Kiyoshi ; Jiang, Weihua ; Suematsu, Hisayuki ; Harada, Nobuhiro ; Imada, Go ; Suzuki, Tsuneo ; Kinemuchi, Y. Oshiaki ; Yang, Sung-Chae
Author_Institution :
Extreme Energy-Density Research Institute, Nagaoka University of Technology, Niigata 940-2188, Japan
fYear :
2000
fDate :
20-25 June 2000
Firstpage :
17
Lastpage :
29
Abstract :
Recent activities of pulsed power technology and its applications are overviewed. Using high density ablation plasma inherent to short range of ion beam in targets, we have successfully prepared crystallized thin film of B4C by ion beam evaporation, which is characterized by hardness, wear resistant, and stability at high temperature. Fullerenes have been prepared as well. Ultrafine nanosize powders have been synthesized by pulsed wire discharge. Flue gas treatment of NOx has been succeeded by intense pulsed relativistic electron beam. Foil acceleration has been observed to be ∼ 8 km/s with the ablation pressure of 13 GPa. Pulsed laser deposition was used to prepare (Cr1∼x,Alx)N films. The AlN solubility limit was found to be 77 at.% AlN. The hardness of the films increases with x up to 0.75, and decreases rapidly due to the presence of amorphous structure. Highly repetitive, new pulsed power generator has been operational, with the specifications of 400 kV, 13 kA, 120 ns, 1 pps.
Keywords :
Artificial intelligence; Microelectronics; Substrates; X-ray scattering; B4C film; flue gas treatment; foil acceleration; highly repetitive pulsed power generator; ion beam ablation plasma; ion beam evaporation; nanosize powders;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
High-Power Particle Beams, 2000 13th International Conference on
Conference_Location :
Nagaoka, Japan
Type :
conf
Filename :
6220108
Link To Document :
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