Use of the pulsed magnetron sputtering of graphite target for the deposition of DLC films

The process of ion-assisted deposition of DLC films by pulse magnetron sputtering of a graphite target is described. To realize this method, a pulsed power supply for powering the magnetron discharge and a pulsed high-voltage generator have been developed. High-voltage substrate biasing, synchronized with magnetron current pulses, was used to control the energy of the ions bombarding the substrate surface. Probe measurements of the plasma have shown that the density of the magnetron discharge plasma reaches values of 10¹⁷–10¹⁸ m⁻³. The experiments on DLC films deposition were carried out with using of different kinds of substrates: single-crystal (111) silicon wafers, titanium, stainless steel, glass. The main result of the experiments was the obtaining of a hard, high-adhesive DLC films.