DocumentCode
563776
Title
Development of large size ion source for ion Shower Doping
Author
Sodekoda, T. ; Kuwabara, H. ; Nakamoto, I. ; Kawasaki, Y. ; Nakashizu, T.
Author_Institution
Mechatronics Development Center, Ishikawajima-Harima Heavy Industries Co., Ltd., 3-1-15 Toyosu, Koto-ku, Tokyo 135-8732, Japan
fYear
2000
fDate
20-25 June 2000
Firstpage
369
Lastpage
372
Abstract
We developed the new Ion Shower Doping system “ISDR series” for formation of TFTS. This system is available for large glass substrate of 680 × 880 mm maximumly. We simplify the glass transform system, so glass move only horizontally. Beam uniformity achieve 2 to 3% (3σ). We introduce here the property of new ISDR series comparing with conventional ISD series.
Keywords
Glass; LCD; TFT; doping; ion; poly-Si;
fLanguage
English
Publisher
ieee
Conference_Titel
High-Power Particle Beams, 2000 13th International Conference on
Conference_Location
Nagaoka, Japan
Type
conf
Filename
6220186
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