• DocumentCode
    563790
  • Title

    Characteristics of CrN films prepared by pulsed laser deposition

  • Author

    Hirai, M. ; Ueno, Y. ; Suzuki, T. ; Jiang, W. ; Grigoriu, C. ; Yatsui, K.

  • Author_Institution
    Extreme Energy-Density Research Institute, Nagaoka University of Technology, Niigata 940-2188, Japan
  • fYear
    2000
  • fDate
    20-25 June 2000
  • Firstpage
    426
  • Lastpage
    429
  • Abstract
    Chromium nitride (CrN) films have been successfully prepared by pulsed laser deposition (PLD). Experiment was carried out by changing the substrate temperature from R.T. to 600°C. The hardness of the films increased gradually with an increase in the substrate temperature up to 400°C, above which it decreased rapidly. Furthermore, the maximum value was HV∼2000. The rapid decrease in the hardness induced at the formation of ellipsoidal grains. The boundaries of these grains seem to be structural defect.
  • Keywords
    Atmospheric measurements; Lasers; Nitrogen; Particle measurements; Substrates; Surface treatment; Temperature measurement; CrN; grain; hardness; thin film;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    High-Power Particle Beams, 2000 13th International Conference on
  • Conference_Location
    Nagaoka, Japan
  • Type

    conf

  • Filename
    6220200
    • Link To Document
    https://search.isc.ac/dl/search/defaultta.aspx?DTC=49&DC=563790