Title :
Thin-film deposition process by pulsed ion-beam generated ablation plasma
Author :
Jiang, W. ; Kawahara, H. ; Shishido, H. ; Suematsu, H. ; Yunogami, T. ; Yatsui, K.
Author_Institution :
Extreme Energy-Density Res. Inst., Nagaoka Univ. of Technol., Nagaoka, Japan
Abstract :
Pulsed ion-beam evaporation (IBE) is a practical technique of thin film deposition. In this paper, the process of IBE is studied with concentration on the importance of physical properties of the target material. The experiments were carried out by using different kinds of metal targets. The results have helped us in understanding the physical relation between the ablation plasma behavior and the thin-film surface morphology.
Keywords :
ion beam assisted deposition; thin films; vacuum deposition; pulsed ion-beam evaporation; pulsed ion-beam generated ablation plasma; thin-film deposition; thin-film surface morphology; Films; Ion beams; Lead; Plasma temperature; Substrates;
Conference_Titel :
High-Power Particle Beams (BEAMS 2004), 2004 International Conference on
Conference_Location :
St. Petersburg
Print_ISBN :
978-5-87911-088-3
