Title :
EUV and plasma observation in capillary Z-pinch xenon plasmas
Author :
Teramoto, Yusuke ; Sato, Hiroto ; Bessho, Kazunori ; Niimi, Gohta ; Shirai, Takahiro ; Yamatani, Daiki ; Takemura, Tetsu ; Yokota, Toshio ; Paul, Khokan C. ; Kabuki, Kiyoyuki ; Miyauchi, Koji ; Ikeuchi, Mitsuru ; Okubo, Keisuke ; Hotta, Kazuaki ; Yoshioka
Author_Institution :
Hiratsuka R&D Center, Extreme Ultraviolet Lithography Syst. Dev. Assoc., Shizuoka, Japan
Abstract :
Capillary Z-pinch plasmas were studied for the sake of EUV light source development for next generation semiconductor lithography. Magnetic pulse compression generator drove the capillary load providing approximately 25 kA of peak current and 275 ns of pulse duration. Radiation characteristics were investigated using 7-mm-diameter and 6-mm-long capillary. Xenon was used as fuel gas for radiating EUV light of which wavelength is l3.5 nm. Measurements covered overall properties of EUV source such as load current and voltage, absolute radiated EUV energy, spectrum, and image of in-band EUV radiation. Optimum gas condition and dependence of Z-pinch dynamics on the gas condition were investigated.
Keywords :
Z pinch; plasma diagnostics; plasma sources; plasma transport processes; ultraviolet lithography; xenon; Xe; absolute radiated EUV energy; capillary Z-pinch xenon plasma; current 25 kA; fuel gas; in-band EUV radiation image; load current; load voltage; magnetic pulse compression generator; next generation semiconductor lithography; ofEUV light source; pulse duration; radiation characteristics; size 6 mm; size 7 mm; time 275 ns; Cathodes; Conductors; Monitoring; Plasmas;
Conference_Titel :
High-Power Particle Beams (BEAMS 2004), 2004 International Conference on
Conference_Location :
St. Petersburg
Print_ISBN :
978-5-87911-088-3
