Development of local ambient gas control technologies for atmospheric MEMS process

Author

Naito, Teruki ; Konno, Nobuaki ; Tokunaga, Takashi ; Itoh, Toshihiro

Author_Institution

Macro BEANS Center, BEANS Lab., Tsukuba, Japan

fYear

2012

fDate

25-27 April 2012

Firstpage

28

Lastpage

31

Abstract

We report on a local ambient gas control technologies for atmospheric pressure plasma process using our new curtain gas structure. First, local ambient gas control with the curtain gas structure was investigated by computational fluid dynamic code. After confirmation of the feasible cleanness level with this structure, which is comparable to impurity level in semiconductor grade material gas (below 1 ppm), we fabricated a prototype apparatus. Measuring gas distribution by a gas analyzer, local ambient gas control was confirmed experimentally. Next, we attempted H₂/He plasma generation in open air with H₂ concentration even above explosive limit in air (4.1 %) and achieved stable glow discharge with H₂ concentration of 0-40 %. In addition, reduction of copper oxides was demonstrated by H₂ plasma exposure. These results show high potential of our method for atmospheric MEMS processes.

Keywords

computational fluid dynamics; explosives; glow discharges; microfabrication; micromechanical devices; plasma applications; plasma diagnostics; plasma instability; reduction (chemical); H₂ concentration; H₂ plasma exposure; atmospheric MEMS process; atmospheric pressure plasma process; cleanness level; computational fluid dynamic code; curtain gas structure; explosive limit; gas analyzer; gas distribution measurement; glow discharge stability; impurity level; local ambient gas control technologies; plasma generation; pressure 1 atm; prototype apparatus fabrication; semiconductor grade material gas; Atmospheric modeling; Copper; Fluid flow; Helium; Micromechanical devices; Plasmas; Process control;

fLanguage

English

Publisher

ieee

Conference_Titel

Design, Test, Integration and Packaging of MEMS/MOEMS (DTIP), 2012 Symposium on

Conference_Location

Cannes

Print_ISBN

978-1-4673-0785-7

Type

conf

Filename

6235317