DocumentCode
565916
Title
Optimization of the digital control system of high power intelligent waveform power supply for electroplating
Author
Sun, Lejia ; He, Jun ; Pei, Yunqing ; Wang, Zhaoan
Author_Institution
Sch. of Electr. Eng., Xi´´an Jiaotong Univ., Xi´´an, China
Volume
3
fYear
2012
fDate
2-5 June 2012
Firstpage
1555
Lastpage
1560
Abstract
This paper describes an optimized digital control system of high power intelligent waveform power supply for electroplating. In order to meet the requirement of high dynamic response of each power unit outputting intelligent waveform and improve the stability of paralleled system, the optimization of the digital control system is taken into considered. By reducing the inherent delay of traditional digital control system, the dynamic response is greatly improved, and by introducing the feedforward control strategy, the rapidity and stability of the device is increased, especially in paralleled system. Based on it, an 8000A/24V intelligent waveform power supply was built by 16 power units in parallel.
Keywords
digital control; dynamic response; electroplating; feedforward; optimisation; power supply quality; power system stability; digital control system; dynamic response; electroplating; feedforward control; high power intelligent waveform power supply; inherent delay reduction; optimization; outputting intelligent waveform; paralleled system; power unit; stability; Artificial intelligence; Delay; Digital control; Feedforward neural networks; Load modeling; Power supplies; digital control; feedforwad control; high power; intelligent waveform;
fLanguage
English
Publisher
ieee
Conference_Titel
Power Electronics and Motion Control Conference (IPEMC), 2012 7th International
Conference_Location
Harbin
Print_ISBN
978-1-4577-2085-7
Type
conf
DOI
10.1109/IPEMC.2012.6259064
Filename
6259064
Link To Document