DocumentCode
566240
Title
6 Tbps/W, 1 Tbps/mm2, 3D interconnect using adaptive timing control and low capacitance TSV
Author
Furuta, Futoshi ; Osada, Kenichi
Author_Institution
3D-Integration Technol. Res. Dept., Assoc. of Super-Adv. Electron. Technol. (ASET), Tokyo, Japan
fYear
2012
fDate
Jan. 31 2012-Feb. 2 2012
Firstpage
1
Lastpage
4
Abstract
We describe a Through Silicon Via (TSV) interconnect for multi-layer stacked chips by using a low capacitance TSV and by introducing a novel circuit design with an adaptive timing control. Studying effects of TSV parasitic capacitances on the interconnect performance, a low capacitance TSV was designed and was experimentally confirmed that the capacitance was 90 fF/TSV. To enhance the performance, an adaptive timing control was applied to a low voltage swing circuit. Feeding back information on the TSV capacitance to an output voltage control as timing signals, difficulties in timing designs resulting from variations of TSV capacitances were resolved. The circuit has scalability to the number of stacked TSVs and a robustness against process-to-process variations of TSV capacitances. The power efficiency of at least 27% is enhanced using the low voltage swing circuit. A data-rate of 1 Tbps/mm2 and the highest power efficiency of 6 Tbps/W were experimentally confirmed using 3D-stacked chips with the low capacitance TSVs.
Keywords
adaptive control; integrated circuit design; integrated circuit interconnections; three-dimensional integrated circuits; voltage control; 3D interconnect; 3D-stacked chips; TSV parasitic capacitance effect; adaptive timing control; capacitance 90 fF; circuit design; low capacitance TSV interconnect; low voltage swing circuit; multilayer stacked chips; through silicon via interconnect; timing signals; voltage control; Integrated circuit interconnections; Low voltage; Parasitic capacitance; Power demand; Through-silicon vias; Timing;
fLanguage
English
Publisher
ieee
Conference_Titel
3D Systems Integration Conference (3DIC), 2011 IEEE International
Conference_Location
Osaka
Print_ISBN
978-1-4673-2189-1
Type
conf
DOI
10.1109/3DIC.2012.6262963
Filename
6262963
Link To Document