DocumentCode :
56671
Title :
A Robust Low Power Carbon Nanotube Sensor Interface Circuit in 180 nm CMOS Technology
Author :
Saiyu Ren ; Lee, George Yu-Heng
Author_Institution :
Dept. of Electr. Eng., Wright State Univ., Dayton, OH, USA
Volume :
13
Issue :
12
fYear :
2013
fDate :
Dec. 2013
Firstpage :
4786
Lastpage :
4795
Abstract :
The design and performance of a low-cost, energy-efficient carbon nanotube sensor interface circuit (SIC) is presented that is aimed at deployable/expendable applications with the sensor operating at ambient temperatures. The submicrometer SIC is designed and fabricated in CMOS 180-nm technology and consumes a maximum of 122 μW, including a decoder and voltage follower. The SIC achieves a measurement accuracy of 1.4% over a 2.5 kΩ to 25 MΩ dynamic range of sensor resistance. A critical issue associated with a submicrometer integrated circuit implementation is satisfactory performance of the SIC for fabrication process variations that range from the slow, to typical, to fast process corners and simultaneously meeting the requirement for the very large dynamic range for sensor resistances. A robust design considering the full range of potential process variations becomes more critical as feature size is reduced. The SIC design includes an added degree for freedom for counteracting process variations during post fabrication calibration. In addition, a new design procedure is outlined and implemented to permit an accurate and efficient first order design to ensure satisfactory performance for typical, fast, and slow model parameters. The first order design is verified by complete model simulation performance, and finally selected measured results are included for a fabricated circuit.
Keywords :
CMOS integrated circuits; carbon nanotubes; integrated circuit design; low-power electronics; nanosensors; nanotube devices; operational amplifiers; C; CMOS technology; SIC design; decoder; design procedure; low power carbon nanotube sensor interface circuit; post fabrication calibration; power 122 muW; resistance 2.5 kohm to 25 Mohm; sensor resistance; size 180 nm; submicrometer SIC; voltage follower; Dynamic range; Fabrication; Field effect transistors; Logic gates; Resistance; Silicon carbide; Carbon nanotube; corner analysis; process variation; sensor interface circuit; sensor measurement;
fLanguage :
English
Journal_Title :
Sensors Journal, IEEE
Publisher :
ieee
ISSN :
1530-437X
Type :
jour
DOI :
10.1109/JSEN.2013.2274655
Filename :
6567893
Link To Document :
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