DocumentCode
56683
Title
Fabrication of nanochannels using underexposed nanoimprint method
Author
Zhiwen Wang ; Jinkui Chu ; Qianyi Wang ; Ran Zhang ; Yan Cui
Author_Institution
Key Lab. for Micro/Nano Technol. & Syst. of Liaoning Province, Dalian Univ. of Technol., Dalian, China
Volume
10
Issue
1
fYear
2015
fDate
1 2015
Firstpage
34
Lastpage
36
Abstract
Uniform arrays of nanochannels were made using an underexposed nanoimprint method. The nanotrenches were bended uniformly, and the degree of the collapse was controlled by the exposure time. After deposition of the sealing material, nanochannels with a dimension of 100 nm were successfully fabricated. The blocking problem was solved by adjusting the parameters of the gratings. The proposed fabrication technique can be very helpful in micro-/nanoanalysis systems.
Keywords
nanofabrication; nanolithography; nanostructured materials; exposure time; microanalysis systems; nanoanalysis systems; nanochannel fabrication; nanotrenches; sealing material; under-exposed nanoimprint; uniform nanochannel arrays;
fLanguage
English
Journal_Title
Micro & Nano Letters, IET
Publisher
iet
ISSN
1750-0443
Type
jour
DOI
10.1049/mnl.2014.0412
Filename
7034943
Link To Document