Title :
Fabrication of nanochannels using underexposed nanoimprint method
Author :
Zhiwen Wang ; Jinkui Chu ; Qianyi Wang ; Ran Zhang ; Yan Cui
Author_Institution :
Key Lab. for Micro/Nano Technol. & Syst. of Liaoning Province, Dalian Univ. of Technol., Dalian, China
Abstract :
Uniform arrays of nanochannels were made using an underexposed nanoimprint method. The nanotrenches were bended uniformly, and the degree of the collapse was controlled by the exposure time. After deposition of the sealing material, nanochannels with a dimension of 100 nm were successfully fabricated. The blocking problem was solved by adjusting the parameters of the gratings. The proposed fabrication technique can be very helpful in micro-/nanoanalysis systems.
Keywords :
nanofabrication; nanolithography; nanostructured materials; exposure time; microanalysis systems; nanoanalysis systems; nanochannel fabrication; nanotrenches; sealing material; under-exposed nanoimprint; uniform nanochannel arrays;
Journal_Title :
Micro & Nano Letters, IET
DOI :
10.1049/mnl.2014.0412
