• DocumentCode
    567992
  • Title

    Performance improvement of pentacene-based organic thin-film transistor with the planar bottom-contact structure and the bi-layer gate dielectric

  • Author

    Fan, Ching-Lin ; Lin, Yu-Zuo ; Huang, Chao-Hung

  • Author_Institution
    Grad. Inst. of Electro-Opt. Eng., Nat. Taiwan Univ. of Sci. & Technol., Taipei, Taiwan
  • fYear
    2012
  • fDate
    4-6 July 2012
  • Firstpage
    199
  • Lastpage
    202
  • Abstract
    This study reports the performance improvement of pentacene-based organic thin-film transistor (OTFT) with the proposed planar bottom-contact structure and the bi-layer gate dielectric. The planar bottom-contact (pBC) structure can provide a continuous plane to enhance the grain growth continuity of pentacene layer, further improving the charge carriers injection or/and transportation near the edge of source/drain electrodes; hence, the pBC structure reduces the contact resistance between the organic semiconductor and the source/drain metals, resulting in the improved field-effect mobility. In addition, the bi-layer gate dielectric is used for the etching selectivity to control the planarization process well.
  • Keywords
    contact resistance; electrical contacts; etching; grain growth; organic field effect transistors; organic semiconductors; planarisation; thin film transistors; bilayer gate dielectric; charge carrier injection; charge carrier transportation; contact resistance; continuous plane; etching selectivity; grain growth continuity; improved field-effect mobility; organic semiconductor; pentacene layer; pentacene-based organic thin-film transistor; performance improvement; planar bottom-contact structure; planarization process; source-drain electrode edge; source-drain metals; Contact resistance; Electrodes; Logic gates; Metals; Organic thin film transistors; Pentacene;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Active-Matrix Flatpanel Displays and Devices (AM-FPD), 2012 19th International Workshop on
  • Conference_Location
    Kyoto
  • Print_ISBN
    978-1-4673-0399-6
  • Type

    conf

  • Filename
    6294880