• DocumentCode
    568015
  • Title

    Photovoltaic thin-film materials characterized using spectroscopic ellipsometry

  • Author

    Fujiwara, Hiroyuki ; Kageyama, Shota ; Yuguchi, Tetsuya ; Kanie, Yosuke

  • Author_Institution
    Center of Innovative Photovoltaic Syst. (CIPS), Gifu Univ., Grfu, Japan
  • fYear
    2012
  • fDate
    4-6 July 2012
  • Firstpage
    281
  • Lastpage
    284
  • Abstract
    To establish new characterization methods for Si-based-thin-film solar cells, we have developed spectroscopic ellipsometry (SE) techniques that can be applied for the analysis of light absorber layers in the solar cells. In particular, our SE analyses allow the detailed characterization of (i) hydrogenated amorphous silicon (a-Si:H) and (ii) microcrystalline silicon ((μc-Si:H) thin films fabricated on large-area glass substrates. For the determination of a-Si:H properties, an optical database, in which the optical constants of a-Si:H are described completely by SiH and SiH2 hydrogen contents, has been constructed. By applying this model, SiH2 contents in a-Si:H layers prepared on glass substrates can be estimated rather easily. Moreover, the μc-Si:H dielectric functions have been parameterized completely by our dielectric function model and this parameterization scheme has been applied successfully to describe the structural variation of a-Si:H/μc-Si:H mixed phase materials. From the above analysis technique, we demonstrate the high-precision analyses of light absorber layers used in the Si thin-film solar cells.
  • Keywords
    amorphous semiconductors; dielectric function; elemental semiconductors; ellipsometry; hydrogen; optical constants; plasma CVD; semiconductor growth; semiconductor thin films; silicon; solar cells; Si-based-thin-film solar cells; Si:H; dielectric functions; high-precision analyses; hydrogenated amorphous silicon thin films; large-area glass substrates; light absorber layers; microcrystalline silicon thin films; mixed phase materials; optical constants; optical database; parameterization scheme; photovoltaic thin-film materials; spectroscopic ellipsometry; Dielectrics; Ellipsometry; Glass; Optical device fabrication; Rough surfaces; Substrates; Surface roughness;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Active-Matrix Flatpanel Displays and Devices (AM-FPD), 2012 19th International Workshop on
  • Conference_Location
    Kyoto
  • Print_ISBN
    978-1-4673-0399-6
  • Type

    conf

  • Filename
    6294905