DocumentCode :
56925
Title :
On the Device Design and Drive-Current Capability of SOI Lateral Bipolar Transistors
Author :
Jin Cai ; Ning, Tak H. ; D´Emic, Christopher P. ; Jeng-Bang Yau ; Chan, Kevin K. ; Joonah Yoon ; Muralidhar, R. ; Dae-Gyu Park
Author_Institution :
IBM Thomas J. Watson Res. Center, Yorktown Heights, NY, USA
Volume :
2
Issue :
5
fYear :
2014
fDate :
Sept. 2014
Firstpage :
105
Lastpage :
113
Abstract :
The SOI symmetric lateral bipolar transistor is uniquely suitable for operation at high injection currents where the injected minority carrier density in the base region is larger than the base doping concentration. Transistors operating in high-injection can achieve record-high drive currents on the order of 3-5 mA/μm. The commonly used Shockley diode and bipolar current equations are modified to be applicable for all injection levels. Excellent agreement is shown between measured and modeled currents for data at VBC = 0. A novel partially depleted-base design can further increase the drive current and the current gain, especially at low VBE.
Keywords :
bipolar transistors; carrier density; semiconductor doping; silicon-on-insulator; SOI symmetric lateral bipolar transistor; Shockley diode; base doping concentration; base region; bipolar current equations; current gain; device design; drive-current capability; injection currents; minority carrier density; partially depleted-base design; Bipolar transistors; Doping; Equations; Implants; Integrated circuits; Niobium; Transistors; Bipolar junction transistor; high-level injection; silicon-on-insulator; symmetric junction;
fLanguage :
English
Journal_Title :
Electron Devices Society, IEEE Journal of the
Publisher :
ieee
ISSN :
2168-6734
Type :
jour
DOI :
10.1109/JEDS.2014.2331053
Filename :
6837451
Link To Document :
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