DocumentCode :
56961
Title :
Improvement of Data Retention During Long-Term Use by Suppressing Conductive Filament Expansion in {\\rm TaO}_{x} Bipolar-ReRAM
Author :
Ninomiya, Tamotsu ; Muraoka, S. ; Zhiqiang Wei ; Yasuhara, R. ; Katayama, Kengo ; Takagi, Toshiyuki
Author_Institution :
Device Solutions Center, Panasonic Corp., Kyoto, Japan
Volume :
34
Issue :
6
fYear :
2013
fDate :
Jun-13
Firstpage :
762
Lastpage :
764
Abstract :
We investigate, for the first time, the expansion of resistive random access memory (ReRAM) conductive filaments during pulse cycles, which may cause retention failure after cycling endurance. We find that filament size becomes larger gradually because of oxygen diffusion from the region surrounding a filament during reset operations. To achieve long-term use of ReRAM while avoiding filament expansion, it is the key to control both an electric power and a pulsewidth input at a switching operation. We successfully demonstrate good data retention even after endurance of 100-k cycles with an optimized reset pulse.
Keywords :
random-access storage; tantalum compounds; TaOx; bipolar-ReRAM; bipolar-resistive random access memory conductive filaments; conductive filament expansion suppression; data retention improvement; filament expansion avoidance; optimized reset pulse; oxygen diffusion; pulse cycles; pulsewidth input; switching operation; Conductive filament (CF); endurance; joule heating; resistive switching random access memory (RAM); retention;
fLanguage :
English
Journal_Title :
Electron Device Letters, IEEE
Publisher :
ieee
ISSN :
0741-3106
Type :
jour
DOI :
10.1109/LED.2013.2258653
Filename :
6515304
Link To Document :
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