Title :
Plasma and ion beam processing at Los Alamos
Author :
Rej, D.J. ; Davis, H.A. ; Henins, I. ; Reass, William A. ; Scheuer, J.T. ; Tobin, J.A. ; Tuszewski, M. ; Waganaar, W.J. ; Wood, B.P. ; Johnston, G.P. ; Nastasi, M. ; Muenchausen, R.E. ; Walter, K.C. ; Williams, Douglas B. ; Faehl, R.J. ; Conrad, J.R. ; Ho
Author_Institution :
Physics Division, Los Alamos National Laboratory, NM 87545, USA
Abstract :
Efforts are underway at Los Alamos National Laboratory to utilize plasma and intense ion beam science and technology for the processing of advanced materials. A major theme involves surface modification of materials, e.g., etching, deposition, alloying, and implantation. In this paper, we concentrate on two programs, plasma source ion implantation and high-intensity pulsed ion beam deposition.
Conference_Titel :
High-Power Particle Beams, 1994 10th International Conference on
Conference_Location :
San Diego, CA, USA
Print_ISBN :
978-1-4244-1518-2
