The short-pulse implanter

The short-pulse high-current implanter with the flow of charged cpecies 10 ¹³ −5.10 ¹³ species/cm² in the pulse end with rate of doze in the target up to 5.10 14 ions/cm2.sec, is developed. The strip line magneto-insulated diode is ion source. This implanter is developed on the base of MA C accelerator by means of replacement of Marx-generator by the high voltage pulse transformer with output voltage up to 300 k V, as well as by means of the some other MA C units´ modification. The implanter has parameters as following: ion energy - up to 150ke V, ion current density - from 10 to 30 A/cm², pulse duration - from 50 to 200 ns, pulse frequency - 10 Hz, ion kind - H⁺, Cⁿ⁺.