DocumentCode :
571137
Title :
Analysis of thermally-annealed InGaN quantum wells for light-emitting diodes
Author :
Jiao, Xuechen ; Zhao, Peng ; Zhao, Hongping
Author_Institution :
Dept. of Electr. Eng. & Comput. Sci., Case Western Reserve Univ., Cleveland, OH, USA
fYear :
2012
fDate :
29-31 May 2012
Firstpage :
1
Lastpage :
5
Abstract :
Thermally-annealed InGaN quantum wells (QWs) with various interdiffusion lengths (Ld) are numerically analyzed as improved active region for Light-Emitting Diodes (LEDs). The calculations of the band structure, wavefunction for electrons and holes are based on a self-consistent 6-band k·p method taking into account the valence band mixing, strain effect, spontaneous and piezoelectric polarizations and carrier screening effect. The spontaneous emission radiative recombination rate (Rsp) was calculated for thermally-annealed 3-nm In0.25Ga0.75N QWs with various interdiffusion lengths (Ld), as compared to that of the conventional InGaN QWs emitting at the similar wavelength. Studies show that the electron-hole wavefunction overlap is significantly enhanced for the thermally-annealed InGaN QWs, which results in the improved spontaneous emission radiative recombination rate for enhancing LED output power.
Keywords :
III-V semiconductors; annealing; band structure; chemical interdiffusion; indium compounds; k.p calculations; light emitting diodes; piezoelectricity; semiconductor quantum wells; spontaneous emission; valence bands; InGaN; LED output power; band structure; carrier screening effect; electron wavefunction; electron-hole wavefunction; hole wavefunction; interdiffusion length; light emitting diode; piezoelectric polarization; self-consistent 6-band k·p method; spontaneous emission radiative recombination rate; spontaneous polarization; strain effect; thermally-annealed quantum well; valence band mixing; wavelength 3 nm; Educational institutions; Gallium nitride; Indexes; Materials; Radiative recombination; Semiconductor diodes; Semiconductor lasers; InGaN QWs; Light-Emitting Diode; interdiffusion; rapid thermal annealing;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Energytech, 2012 IEEE
Conference_Location :
Cleveland, OH
Print_ISBN :
978-1-4673-1836-5
Electronic_ISBN :
978-1-4673-1834-1
Type :
conf
DOI :
10.1109/EnergyTech.2012.6304639
Filename :
6304639
Link To Document :
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