DocumentCode :
571868
Title :
Fault localization using IR lock-in thermography for flashover between the gate rail and the source metal clip
Author :
Lau, C.K.
Author_Institution :
Infineon Technol. Malaysia Sdn. Bhd., Batu Berendam, Malaysia
fYear :
2012
fDate :
2-6 July 2012
Firstpage :
1
Lastpage :
4
Abstract :
This paper presents fault localization on MOSFET´s gate-source continuity short failures using IR Lock-in Thermography which successfully detected a hot spot under the source metal clip without package decapsulation. Micro-sectioning analysis performed on the hot spot location revealed flashover between the source metal clip and the gate rail.
Keywords :
MOSFET; fault diagnosis; flashover; infrared imaging; semiconductor device reliability; IR lock-in thermography; MOSFET; fault localization; flashover; gate rail; gate-source continuity short failure; hot spot location; microsectioning analysis; source metal clip; Aluminum; Failure analysis; Fingers; Flashover; Logic gates; Rails;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Physical and Failure Analysis of Integrated Circuits (IPFA), 2012 19th IEEE International Symposium on the
Conference_Location :
Singapore
ISSN :
1946-1542
Print_ISBN :
978-1-4673-0980-6
Type :
conf
DOI :
10.1109/IPFA.2012.6306294
Filename :
6306294
Link To Document :
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