Electrostatic field distribution measurement using silicon micro-mirror array

Author

Kuriyama, Toshihide ; Aoi, Toshikazu ; Takatsuji, Wataru ; Maeda, Hiroshi ; Itoh, Takaki ; Ueno, Yoshifumi ; Nakaie, Toshiyuki ; Matsui, Jun ; Miyamoto, Yoshiaki

Author_Institution

Fac. of Biol.-Oriented Sci. & Technol., Kinki Univ., Wakayama, Japan

fYear

2012

fDate

6-10 Aug. 2012

Firstpage

351

Lastpage

356

Abstract

Electrostatic field distribution measurement using a silicon micro-mirror array fabricated by Micro-ElectroMechanical Systems (MEMS) process has been presented. The deflection of each micro-mirror by electrostatic field was measured optically using a two-dimensional optical scanner and a position sensitive detector (PSD). The obtained electrostatic data showed good agreement with Coulomb´s law and the system was applied to a human body model.

Keywords

electric field measurement; electrostatics; micro-optomechanical devices; micromirrors; optical arrays; optical scanners; Coulomb law; Si; electrostatic field distribution measurement; human body model; microelectromechanical systems process; micromirror array; position sensitive detector; two dimensional optical scanner; Electrostatic measurements; Electrostatics; Laser beams; Measurement by laser beam; Mirrors; Optical variables measurement; Voltage measurement;

fLanguage

English

Publisher

ieee

Conference_Titel

Electromagnetic Compatibility (EMC), 2012 IEEE International Symposium on

Conference_Location

Pittsburgh, PA

ISSN

2158-110X

Print_ISBN

978-1-4673-2061-0

Type

conf

DOI

10.1109/ISEMC.2012.6351823

Filename

6351823