DocumentCode
577902
Title
Planar InAs photodiodes fabricated using He ion implantation
Author
Sandall, Ian ; Tan, Chee Hing ; Smith, Andrew ; Gwilliam, Russell
Author_Institution
Dept. of Electron. & Electr. Eng., Univ. of Sheffield, Sheffield, UK
fYear
2012
fDate
23-27 Sept. 2012
Firstpage
165
Lastpage
166
Abstract
This work has shown that it is possible to use He implantation with InAs to produce highly resistive areas and that when combined with post implantation annealing, a sufficiently high resistive region can be formed to allow the fabrication of a planar photodiode.
Keywords
helium; indium compounds; ion implantation; photodiodes; He; InAs; ion implantation; photodiodes; resistive region; Annealing; Conductivity; Helium; Ion implantation; P-i-n diodes; Photodiodes; Temperature measurement;
fLanguage
English
Publisher
ieee
Conference_Titel
Photonics Conference (IPC), 2012 IEEE
Conference_Location
Burlingame, CA
Print_ISBN
978-1-4577-0731-5
Type
conf
DOI
10.1109/IPCon.2012.6358542
Filename
6358542
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